Form 9.B Project Summary
Chron:
971573
Proposal
Number:
09.03-4800
Project Title:
A Validated Computational Model to
Enable Real Time Control of the Pulsed
OMCVD Process for Heteroepitaxy of
Compound Semiconductors
Technical Abstract (Limit 200 words)
Pulsed Organo-Metallic Chemical Vapor
Deposition (OMCVD) is being investigated for
ground-based and microgravity applications by
NASA and North Carolina State University (NCSU)
as an effective technique to eliminate defects
during heteroepitaxial growth of compound
semiconductors. This technique requires tight
process control to regulate the sequence and
duration of pulses in response to instantaneous
growth patterns. It is proposed to develop and
validate an advanced computational tool as a
critical enabling technology for process control for
pulsed OMCVD.
Phase I will focus on developing a kinetic model for
the surface reaction pathways during OMCVD. The
model will be tested by implementation into an
existing CFD code. A multi-dimensional
computational model will be developed for the
NCSU OMCVD reactor and detailed simulations of
flow, heat/mass transfer and gas/surface chemistry
will be performed. The model predictions for
ground-based growth will be validated against
measured NCSU data . The model will also be used
in support of the NCSU space flight experiment
design and operation. The Phase II work will focus
on extensive validation of the chemistry models
over a range of operating conditions. Advanced
Monte Carlo models will be applied to understand
the microstructural evolution of the film. A series of
parametric simulations will be performed to
determine optimal operating conditions for the
reactor. The model will be fully validated using
ground-based and microgravity flight data.
Potential Commercial Applications (Limit 200 words)
Heteroepitaxy of compound semiconductor
materials on heterogeneous substrates is a vital
technology for optoelectronics in the blue to
ultra-violet wavelength region and non-linear optics
in the infra-red region and power devices and
integrated sensor devices. The proposed model will
be an enabling technology in demonstrating
defect-free heteroepitaxial growth by facilitating
appropriate control of the pulsed OMCVD process.
Name and Address of Principal Investigator (Name,
Organization Name, Mail Address, City/State/Zip)
Dr. Samuel A. Lowry
CFD Research Corporation
215 Wynn Drive
Huntsville , AL 35805
Name and Address of Offeror (Firm Name, Mail Address,
City/State/Zip)
Dr. Andrzej J. Przekwas
CFD Research Corporation
215 Wynn Dr.
Huntsville , AL 35805