Project Title:

Advanced Seal Materials by Ion Beam Enhanced Deposition

01.02-6000
Project Title:Advanced Seal Materials by Ion Beam Enhanced Deposition
Company:Spire Corporation
Bedford, Ma 01730
Principal Investigator:James K. Hirvonen

Abstract:

The use of ion as a means of enhancing the properties of  deposited thin films has
attracted considerable interest in the last few years.  The further development of
energetically-enhanced ion deposition techniques is expected to result in a new generation
of exotic coatings with superior adhesion, near-theoretical densities, very high
hardness, and, at the same time, capable of being deposited at low temperature. 
Spire Corporation proposes to develop a ion beam enhanced deposition technique for
creation of a super adherent hard coating of Si3N4.  In this approach a thin layer
of material (e.g.,Si) is sputtered onto a surface and concurently bombarded with
a steady beam of ions (e.g. Nitrogen).  Coatings produced by this novel technique
promise superior wear resistance and adhesion at low processing temperatures thus
avoiding distortion of precision RCE components.