NASA SBIR 2019-II Solicitation

Proposal Summary

 19-2- S2.04-3272
 X-Ray Mirror Systems Technology, Coating Technology for X-Ray-UV-OIR, and Free-Form Optics
 Advanced Nanometer Coordinate Measuring Machine
SMALL BUSINESS CONCERN (Firm Name, Mail Address, City/State/Zip, Phone)
OptiPro Systems, LLC
6368 Dean Parkway
Ontario, NY 14519
(585) 265-0160

PRINCIPAL INVESTIGATOR (Name, E-mail, Mail Address, City/State/Zip, Phone)
David Mohring
6368 Dean Parkway
Ontario, NY 14519 - 8970
(585) 265-0160

BUSINESS OFFICIAL (Name, E-mail, Mail Address, City/State/Zip, Phone)
Matthew Carlson
6368 Dean Parkway
Ontario, NY 14519 - 8970
(585) 265-0160

Estimated Technology Readiness Level (TRL) :
Begin: 3
End: 5
Technical Abstract (Limit 2000 characters, approximately 200 words)

In Phase I, we have begun development of an advanced nanometer coordinate measuring machine (ANCMM; pronounced ’aŋ-kem) to complement the metrology probe and complete the metrology solution.  The ANCMM will enable larger, lower cost, and higher quality freeform and aspheric optics, bridging the present gap between commercial coordinate measuring machines (CMMs) and interferometry, and, for many applications, replacing areal interferometry as the primary means of feedback to optical fabrication and requirements verification.  This work will push CMM technology into the realm currently dominated by expensive, complex, and error-prone optical testing.  Current and near-future, large optics applications would benefit from the ANCMM by reducing their fabrication cost and schedule and improving their technical risk posture.  Current optical metrology techniques struggle to meet requirements and are rife with potential for systematic error.  For many manufacturers, the expense of optical testing often precludes the types of cross checks that are important to protecting their products from systematic error.  Cross checks that show that presumed superior, unverifiable, optical tests that have uncertainties which overlap higher-uncertainty, flexible, metrology can identify “gross errors”.  Large, meter-class optics with figure error tolerances better than or of-order 10 nm RMS are required for current and near-future telescopes for astrophysics.  The ANCMM platform concept proposed herein will incorporate new laser measurement components and strategies with the metrology loop separate from the motion control feedback loop.   This concept will also incorporate a tactile and non-contact probe sensor system for datum and surface form metrology. 

Potential NASA Applications (Limit 1500 characters, approximately 150 words)

Primary and secondary concept mirror designs for the LUVOIR, OST and Lynx x-ray mirror assembly  and off axis parabolics have been reviewed and we have developed the requirements for a next level metrology platform.  The current reliance on standard interferometric measurement methods limits the geometric concept design of mirrors in new missions.  Freeform surface metrology is fundamental for the success of future NASA missions in Astrophysics, Earth Science, Planetary Science and Cubesat platforms including the SAFE Minispec instrument.

Potential Non-NASA Applications (Limit 1500 characters, approximately 150 words)

OptiPro Systems provides state of the art manufacturing and measurement solutions for prime contractors and a host of precision optics manufacturers.  The proposed ANCMM platform will provide a method to measure freeform optics, parabolic mirrors, Acylinder and toric geometries to lower uncertainty than currently available. 

Duration: 24

Form Generated on 05/04/2020 06:27:43