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Glenn
Research Center
1992 Phase II
Microscopic
and Macroscopic Modeling of Layer Growth Kinetics and Morphology in
Vapor Deposition Processing
CFD
Research Corporation
Huntsville, AL
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INNOVATION
Simulation tool
(CFD-FILM) to enable development of new materials for semiconductor
and opto-electronic applications, as well as for structural and thermal
barrier coatings
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Simulation of Step Bunching in SiC
Growth (using CFD-FILM)
Optional Powerpoint
file
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ACCOMPLISHMENTS
- Developed a Monte Carlo microscopic
model to simulate specific morphological characteristics of film
growth such as step bunching, thermal roughening, polytype growth,
growth uniformity, defect formation, etc.
- Created a commercial software,
CFD-FILM, to analyze morphology of growing films
- Validated the microscopic model
against experimental data for materials such as Si, diamond and
SiC
- Coupled CFD-FILM with a general
purpose macroscopic transport/ chemistry software, CFD-ACE
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COMMERCIALIZATION
- Contributed to increased sales
of CFD-ACE to leading semi-conductor equipment vendors and process
designers (~$500K/year)
- CFD-FILM is marketable as a
stand-alone module, as well as an add-on module with CFD-ACE
- Application projects from industry
and research projects from government agencies
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GOVERNMENT/SCIENCE
APPLICATIONS
- Provides an enabling technology
for advanced materials such as GaN, GaAs, InP, and SiC
- Provides a base technology for
extension to plasma-substrate interactions in low pressure etch
processes
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| For more
information about this firm, please send e-mail to company
representative
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